These are high-intensity point light source mercury vapor-filled lamps based on xenon lamps.
They feature far-ultraviolet radiation in the 230 to 320 nm wavelength range, used for short-wavelength photochemical reactions, UV curing and lithography.

1. Enhanced electrodes design for precise positioning and high arc stability.

2. Improved manufacturing process enables extended life.

3. USHIO developed product with tightly controlled ISO quality processes.